Infrared Spectra of NO, N2O, NO2 and Oi Adsorbed on SiO Films

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dc.contributor.authorLubezky, Aviva
dc.contributor.authorFolman, Mordechai
dc.date.accessioned2025-11-21T10:58:47Z
dc.date.available2025-11-21T10:58:47Z
dc.date.issued1978
dc.description.abstractInfrared spectra of nitrogen and oxygen adsorbed on high surface area SiO films were investigated at different temperatures and surface coverages. On adsorption of NO at 77 K and at low coverage, decomposition of the molecule takes place with simultaneous oxidation of the surface. At higher coverages N2O is formed. On partially or completely oxidized surface absorptions due to NO dimers are obtained. On adsorption of NO2 at 136, 250, 273 and 300 K on freshly prepared SiO films decomposition of the molecule takes place with formation of NO and here again complexes with the surface are formed which are similar to those obtained when NO is adsorbed.en_US
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/jspui/handle/123456789/20179
dc.language.isoenen_US
dc.publisherJournal of the Chemical Society : Faraday Transaction - I. The Chemical Society, London. 1978, 74 (09-12)en_US
dc.subjectChemistryen_US
dc.subjectInfrared spectroscopyen_US
dc.subjectNO adsorptionen_US
dc.subjectJournal of the Chemical Society : Faraday Transaction - Ien_US
dc.titleInfrared Spectra of NO, N2O, NO2 and Oi Adsorbed on SiO Filmsen_US
dc.typeArticleen_US

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