Investigations on high-κ dielectrics for low threshold voltage and low leakage zinc oxide thin-film transistor, using material selection methodologies

Abstract

This paper presents the investigations on high-κ dielectrics for low operating voltage and low leakage zinc oxide thin film transistor (ZnO TFT) using three material selection methodologies namely Ashby, technique for order preference by similarity to ideal solution (TOPSIS) and VlseKriterijumska Optimizacija I Kompromisno Resenjein in Serbian (VIKOR). Various material properties such as dielectric constant, conduction band offset to ZnO, band-gap and temperature coefficient mismatch of high κ to ZnO are investigated to find out the most promising gate dielectric material. The analysis concludes that lanthanum oxide (La2O3) is the most promising gate dielectric material for ZnO TFT transistor. The result shows a good agreement between Ashby’s, TOPSIS and VIKOR approaches.