Photolytic Decomposition of Polymethacrylates: Part 3.—Poly(ethyl methacrylate)

dc.contributor.authorMacCallum, J. R.
dc.contributor.authorSchoff, C. K.
dc.date.accessioned2025-02-04T14:36:46Z
dc.date.available2025-02-04T14:36:46Z
dc.date.issued1972
dc.description.abstractThe kinetics and mechanism of the photochcmically induced depolymerization of poly(cthyl methacrylate) arc investigated. Monochromatic ultra-violet radiation, wavelength 253.7 nm has been used on samples heated in vacuum to temperatures greater than 403 K. It is concluded that the mechanism, like that postulated for poly(mcthyl methacrylate), is one of random scission followed by complete unzipping of the molecules.en_US
dc.identifier.urihttps://dspace.bits-pilani.ac.in/handle/123456789/17182
dc.language.isoenen_US
dc.publisherJournal of the Chemical Society : Faraday Transaction - I. The Chemical Society, London. 1972, 68 (3)en_US
dc.subjectChemistryen_US
dc.subjectPhotolytic Decompositionen_US
dc.subjectPolymethacrylatesen_US
dc.subjectJournal of the Chemical Society : Faraday Transaction - Ien_US
dc.titlePhotolytic Decomposition of Polymethacrylates: Part 3.—Poly(ethyl methacrylate)en_US
dc.typeArticleen_US

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