Stand-by Power Reduction Using Experimentally Demonstrated Nano-Electromechanical Switch in CMOS Technologies

dc.contributor.authorRao, V. Ramgopal
dc.date.accessioned2023-10-20T09:18:33Z
dc.date.available2023-10-20T09:18:33Z
dc.date.issued2021-02
dc.description.abstractIn this article, we demonstrate a double-clamped nano-electromechanical switch (NEMS) with low stand-by power as an effective solution to the leakage issues in scaled CMOS-based power gating (PG) in logic circuits. The proposed NEMS structure is achieved to have a low pull-in (~1.2 V), low hysteresis (<0.3 V), low turn-on delay (35 ns), and subthreshold slope of <6 mV/decade. This enables reduction in stand-by power dissipation in sub 10-nm CMOS technologies with a narrow 100 nm dimple gap for the low-power NEMS. We illustrate that the PG in ISCAS’85 benchmark circuits using the proposed fabricated NEMS shows significant leakage energy reduction for TON/TOFF<0.01 as compared to the sub 10-nm CMOS based PG.en_US
dc.identifier.urihttps://ieeexplore.ieee.org/document/9296248
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12555
dc.language.isoenen_US
dc.publisherIEEEen_US
dc.subjectEEEen_US
dc.subjectFinFETen_US
dc.subjectISCAS’85en_US
dc.subjectNano-electro mechanical switch (NEMS)en_US
dc.subjectNanowire FET (NWFET)en_US
dc.titleStand-by Power Reduction Using Experimentally Demonstrated Nano-Electromechanical Switch in CMOS Technologiesen_US
dc.typeArticleen_US

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