Chemical Vapour Deposition of TiO2 Film Using an Organometallic Process and its Photoelectrochemical Behaviour

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dc.contributor.authorTakahashi, Yasutaka
dc.contributor.authorTsuda, Katsumi
dc.contributor.authorSugiyama, Kohzo
dc.date.accessioned2026-02-05T11:17:58Z
dc.date.available2026-02-05T11:17:58Z
dc.date.issued1981
dc.description.abstractVapour pyrolysis of ethyl titanate has been performed in order to obtain thin TiO2 films. A selective deposition of rutile films is found to occur when substrate temperatures are below 500°C and the gas phase has a large linear velocity. The physical properties of the as-grown films, including their photoelectrochemical behaviour, are examined in relation to their condition of deposition. A thick rutile film grown on a Ti plate converts light energy to electricity with good quantum efficiency in a photoelectrochemical cell.en_US
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/jspui/handle/123456789/20651
dc.language.isoenen_US
dc.publisherJournal of the Chemical Society : Faraday Transaction - I. The Chemical Society, London. 1981, 77 (05)en_US
dc.subjectChemistryen_US
dc.subjectChemical vapour depositionen_US
dc.subjectSemiconductor photoelectrochemistryen_US
dc.subjectJournal of the Chemical Society : Faraday Transaction - Ien_US
dc.titleChemical Vapour Deposition of TiO2 Film Using an Organometallic Process and its Photoelectrochemical Behaviouren_US
dc.typeThesisen_US

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