3D TCAD based approach for the evaluation of nanoscale devices during ESD failure

dc.contributor.authorRao, V. Ramgopal
dc.date.accessioned2023-11-02T10:52:01Z
dc.date.available2023-11-02T10:52:01Z
dc.date.issued2010-11
dc.description.abstractThis paper demonstrates a 3D TCAD based approach towards the evaluation and pre-silicon development of nanoscale devices for advanced ESD protection concepts. Impact of various physical models and parameters on the accuracy of predicted ESD figures of merit are discussed. Moreover, various devices options, have been evaluated from 3D TCAD simulations.en_US
dc.identifier.urihttps://ieeexplore.ieee.org/abstract/document/5682919
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12823
dc.language.isoenen_US
dc.publisherIEEEen_US
dc.subjectEEEen_US
dc.subjectElectrostatic discharge (ESD)en_US
dc.subjectSpace charge modulationen_US
dc.subjectThermal failureen_US
dc.subjectMoving filamentsen_US
dc.title3D TCAD based approach for the evaluation of nanoscale devices during ESD failureen_US
dc.typeArticleen_US

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