Material selection methodology for radio frequency (RF) microelectromechanical (MEMS) capacitive shunt switch

dc.contributor.authorGupta, Navneet
dc.date.accessioned2023-02-06T04:08:05Z
dc.date.available2023-02-06T04:08:05Z
dc.date.issued2018-02
dc.description.abstractThis paper describes the process of selecting the most optimum Radio Frequency Micro- electro- mechanical-systems (RF-MEMS) switch design using Ashby’s methodology. The switches are compared on the basis of parameters like actuation voltage, insertion loss, isolation and switching time using material selection charts. The chart shows that a low-voltage metal-to-metal contact shunt capacitive RF-MEMS having a bridge structure with Si-GaAs substrate, electroplated gold contacts and silicon nitride dielectric layer, is the most optimum of all the switches considered.en_US
dc.identifier.urihttps://link.springer.com/article/10.1007/s00542-018-3761-1
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/8962
dc.language.isoenen_US
dc.publisherSpringeren_US
dc.subjectEEEen_US
dc.subjectRadio frequency (RF)en_US
dc.subjectMicroelectromechanical (MEMS)en_US
dc.subjectSwitchesen_US
dc.titleMaterial selection methodology for radio frequency (RF) microelectromechanical (MEMS) capacitive shunt switchen_US
dc.typeArticleen_US

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