Photoplastic NEMS with an Encapsulated Polysilicon Piezoresistor
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Date
2008
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Publisher
IEEE
Abstract
We demonstrate a photoplastic NEMS device that has an encapsulated polysilicon piezoresistor. The crucial temperature limitation of depositing a polysilicon film on a polymer was overcome by employing a novel Hotwire CVD process. In this paper, we report the fabrication and characterization of a novel polymeric cantilever with an embedded piezoresistor, which exploits the low Youngs modulus of a polymer and high gauge factor of polysilicon. Such devices are widely used for sensing biochemicals.
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Keywords
EEE, Electrical resistance measurement, Substrates, Polymers, Voltage measurement, Distance measurement