A Study of the Effect of Plasma Etch Damage on Sub-Micron MOSFET's Flicker Noise Properties
| dc.contributor.author | Rao, V. Ramgopal | |
| dc.date.accessioned | 2023-11-07T10:58:30Z | |
| dc.date.available | 2023-11-07T10:58:30Z | |
| dc.date.issued | 1998-09 | |
| dc.identifier.uri | https://ieeexplore.ieee.org/document/1503616 | |
| dc.identifier.uri | http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12905 | |
| dc.language.iso | en | en_US |
| dc.publisher | IEEE | en_US |
| dc.subject | EEE | en_US |
| dc.subject | Plasma properties | en_US |
| dc.subject | Plasma applications | en_US |
| dc.subject | Plasma measurements | en_US |
| dc.subject | Noise measurement | en_US |
| dc.subject | Noise figure | en_US |
| dc.subject | Plasma devices | en_US |
| dc.title | A Study of the Effect of Plasma Etch Damage on Sub-Micron MOSFET's Flicker Noise Properties | en_US |
| dc.type | Article | en_US |
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