Highly resistive body STI NDeMOS: An optimized DeMOS device to achieve moving current filaments for robust ESD protection

dc.contributor.authorRao, V. Ramgopal
dc.date.accessioned2023-11-03T07:11:50Z
dc.date.available2023-11-03T07:11:50Z
dc.date.issued2009
dc.description.abstractA novel DeMOS device with modified body and source region in grounded gate (gg) NMOS configuration for ESD protection is proposed. Detailed 3D simulations indicate a high failure threshold because of moving current filaments and self-protection from gate oxide breakdown, even for fast transients. A detailed physics of second basepushout and moving filaments is discussed.en_US
dc.identifier.urihttps://ieeexplore.ieee.org/document/5173344
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12839
dc.language.isoenen_US
dc.publisherIEEEen_US
dc.subjectRobustnessen_US
dc.subjectElectrostatic dischargesen_US
dc.subjectElectric breakdownen_US
dc.subjectSwitchesen_US
dc.subjectStressen_US
dc.subjectBreakdown voltageen_US
dc.titleHighly resistive body STI NDeMOS: An optimized DeMOS device to achieve moving current filaments for robust ESD protectionen_US
dc.typeArticleen_US

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