A Novel Drain-Extended FinFET Device for High-Voltage High-Speed Applications

dc.contributor.authorRao, V. Ramgopal
dc.date.accessioned2023-10-26T10:08:52Z
dc.date.available2023-10-26T10:08:52Z
dc.date.issued2012-10
dc.description.abstractA novel drain-extended FinFET device is proposed in this letter for high-voltage and high-speed applications. A 2 × better R ON versus V BD tradeoff is shown from technology computer-aided design simulations for the proposed device, when compared with a conventional device option. Moreover, a device design and optimization guideline has been provided for the proposed device.en_US
dc.identifier.urihttps://ieeexplore.ieee.org/abstract/document/6269049
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12647
dc.language.isoenen_US
dc.publisherIEEEen_US
dc.subjectEEEen_US
dc.subjectDrain extended MOSFET (DeMOS)en_US
dc.subjectFinFETen_US
dc.subjectHigh voltage (HV)en_US
dc.subjectSystem-on-a-chip (SoC)en_US
dc.titleA Novel Drain-Extended FinFET Device for High-Voltage High-Speed Applicationsen_US
dc.typeArticleen_US

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